传统的红外成像反舰导弹的干扰策略如热焰弹和烟雾等已经不能很好地应对新型红外成像反舰导弹的威胁，针对该问题，设计一种在舰船表面不同分区施加水幕来对抗红外成像反舰导弹的策略，采用建模仿真的方式开展了水幕对红外成像导引头干扰效果的研究。建立综合考虑海天背景的舰船红外辐射仿真模型，结合典型图像识别算法，分析制定了不同的水幕施加策略，利用仿真模型研究在一定距离不同策略下红外成像导引头对目标识别的成功率；根据识别结果和算法原理对水幕施加策略进行优化，优化后的分区水幕施加策略可使导引头对目标的识别成功率下降约60%。最后通过在现实场景中搭建的降温缩比试验装置验证了水幕的降温效果。

A Te-free binary phase change material SbBi is proposed as a new inorganic photoresist for heat-mode lithography. It shows good film-forming ability (surface roughness <1 nm), low threshold power for crystallization (2 mW), and high etching selectivity (15:1). Line-type, dot-type, and complex pattern structures with the smallest feature size of 275 nm are fabricated on SbBi thin films using a 405 nm diode laser direct writing system. In addition, the excellent grating structures with a period of 0.8 μm demonstrate that thermal interference does not affect the adjacent microstructures obviously. These results indicate that SbBi is a promising laser heat-mode resist material for micro/nanostructure fabrication.

In this work, TeO0.7 thin films were prepared by the reactive magnetron-controlling sputtering method. Complex gray-scale patterns were successfully fabricated on TeO0.7 thin films through the laser direct writing method. The structural origin of TeO0.7 thin film was investigated for gray-scale pattern formation. It is found that multiple gray-scale levels are dependent on the “virtual” bandgap energy of TeO0.7 thin films. The bandgap energy changes lead to refractive index and reflectivity difference. Thus, gray-scale tones can be formed. By accurately controlling laser energy, various “virtual” bandgaps can be generated in TeO0.7 thin films, and colorful gray-scale levels can be formed. Experimental results indicate that TeO0.7 thin film can be used as micro/nano image writing material.

Metal hydrazone complex thin films are used as laser patterning materials, and the patterns with a minimum resolution of about 78 nm are successfully obtained by the laser writing setup (λ=405 nm, NA=0.9). The minimum resolution is only about 1/8 of the writing spot size. In the formation of patterns, there is only a single step for forming patterns by the laser heating-induced clear thermal gasification threshold effect without any other development processes such as wet etching. This work provides an effective method for directly achieving nanoscale-resolved pattern structures with diode-based maskless laser writing lithography at visible light wavelengths.